发明申请
- 专利标题: Process of forming silicon-based nanowires
- 专利标题(中): 形成硅基纳米线的工艺
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申请号: US10918479申请日: 2004-08-16
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公开(公告)号: US20050176264A1公开(公告)日: 2005-08-11
- 发明人: Ming-Shyong Lai , Chih-Jen Lin , Hung-Cheng Chen , Jyh-Chung Wen
- 申请人: Ming-Shyong Lai , Chih-Jen Lin , Hung-Cheng Chen , Jyh-Chung Wen
- 优先权: TW93103228 20040211
- 主分类号: C30B23/00
- IPC分类号: C30B23/00 ; C30B29/06 ; C30B29/60 ; H01L21/26
摘要:
A process of forming silicon-based nanowires heats high-surface-oxygen-content silicon powders to initiate vapor-solid reaction to form nanowires. The reaction gas is charged to react with the Si powders to form the silicon-based nanowires such as silicon nanowires or SiC nanowires. With control of the reaction gas, the components of the nanowires can be exactly controlled without the addition of metallic catalysts. Thereby, the nanowires can be made with reduced cost.
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