发明申请
- 专利标题: Surface emitting semiconductor laser
- 专利标题(中): 表面发射半导体激光器
-
申请号: US11105450申请日: 2005-04-14
-
公开(公告)号: US20050180476A1公开(公告)日: 2005-08-18
- 发明人: Akira Sakamoto , Hideo Nakayama , Yasuaki Miyamoto , Jun Sakurai
- 申请人: Akira Sakamoto , Hideo Nakayama , Yasuaki Miyamoto , Jun Sakurai
- 申请人地址: JP Tokyo
- 专利权人: Fuji Xerox Co., Ltd.
- 当前专利权人: Fuji Xerox Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2002-256525 20020902
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01S5/183 ; H01S5/20 ; H01S5/22 ; H01S5/323 ; H01S5/00
摘要:
A method of fabricating a surface emitting semiconductor laser includes a first step of forming, on a substrate, multiple monitor-use semiconductor layers having stripes radiating from a center of the substrate, and a laser portion that includes semiconductor layers and is located on the periphery of the multiple monitor-use semiconductor layers, a second step of monitoring oxidized conditions on the multiple monitor-use semiconductor layers when a selectively oxidized region is formed in the laser portion, and a third step of controlling oxidization of the selectively oxidized region on the basis of the oxidized conditions thus monitored.
公开/授权文献
- US07079561B2 Surface emitting semiconductor laser 公开/授权日:2006-07-18
信息查询
IPC分类: