发明申请
- 专利标题： Patterning substrate and cell culture substrate
- 专利标题（中）： 图案化底物和细胞培养基质
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申请号： US10986641申请日： 2004-11-12
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公开(公告)号： US20050186674A1公开(公告)日： 2005-08-25
- 发明人: Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi
- 申请人： Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi
- 优先权： JP2003-385020 20031114
- 主分类号： C12M3/00
- IPC分类号： C12M3/00 ; C12N5/00 ; C12N5/02 ; C12N11/00 ; H01L21/00
摘要：
The present invention intends primarily to provide such as a cell culture patterning substrate that is used to adhere a cell in a highly precise pattern on a base material to culture and a cell culture substrate on which a cell is adhered in a high precision pattern. In order to achieve the above-mentioned object, the present invention provides a patterning substrate having a base material and a cell culture patterning layer that is formed on the base material and has at least a photocatalyst and a cell adhesive material that has the adhesiveness with the cell and is decomposed or modified owing to an action of the photocatalyst in combination with energy irradiation.
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