Invention Application
- Patent Title: Method and apparatus for the monitoring and control of a semiconductor manufacturing process
- Patent Title (中): 用于监测和控制半导体制造工艺的方法和装置
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Application No.: US11087071Application Date: 2005-03-23
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Publication No.: US20050187649A1Publication Date: 2005-08-25
- Inventor: Merritt Funk , Raymond Peterson
- Applicant: Merritt Funk , Raymond Peterson
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: G05B19/418
- IPC: G05B19/418 ; G05B23/02 ; H01L21/00 ; H01L21/66 ; G06F19/00
Abstract:
An Advanced Process Control (APC) system including Graphical User Interfaces (GUIs) is presented for monitoring and controlling a semiconductor manufacturing process that is performed by a semiconductor processing system. The semiconductor processing system includes a number of processing tools, a number of processing modules (chambers), and a number of sensors, and the APC system comprises an APC server, database, interface server, client workstation, and GUI component. The GUI is web-based and is viewable by a user using a web browser.
Public/Granted literature
- US07123980B2 Method and apparatus for the monitoring and control of a semiconductor manufacturing process Public/Granted day:2006-10-17
Information query
IPC分类:
