发明申请
US20050191522A1 Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film
审中-公开
涂有锆化合物膜的制品，用于制备该制品的方法和用于涂覆该膜的溅射靶
- 专利标题： Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film
- 专利标题（中）： 涂有锆化合物膜的制品，用于制备该制品的方法和用于涂覆该膜的溅射靶
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申请号： US11100520申请日： 2005-04-07
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公开(公告)号： US20050191522A1公开(公告)日： 2005-09-01
- 发明人: Toshiaki Anzaki , Daisuke Inaoka , Yoshifumi Kijima
- 申请人： Toshiaki Anzaki , Daisuke Inaoka , Yoshifumi Kijima
- 专利权人： Nippon Sheet Glass Co., Ltd.
- 当前专利权人： Nippon Sheet Glass Co., Ltd.
- 优先权： JP2002-250116 20020829; JP2003-176242 20030620
- 主分类号： C03C17/245
- IPC分类号： C03C17/245 ; B01J35/02 ; C03C17/34 ; C23C14/06 ; C23C14/08 ; C23C14/34 ; B32B9/00 ; B32B19/00
摘要：
A method for forming a zirconium compound film on a substrate by a sputtering process using a zirconium target which contains a metal (such as tin or zinc) of which the sputtering yield in an argon atmosphere is more than twice that of zirconium in place of a conventional metallic zirconium target. An article coated with the zirconium compound film and a sputtering target used for coating the film are provided. It is desirable that the content of the metal be 1-45 at %, but a third metal can be added thereto.
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