发明申请
- 专利标题： System for purifying purge gases
- 专利标题（中）： 吹扫气净化系统
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申请号： US11057311申请日： 2005-02-11
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公开(公告)号： US20050195376A1公开(公告)日： 2005-09-08
- 发明人: Dieter Schmerek
- 申请人： Dieter Schmerek
- 优先权： DE102004008080.1 20040219
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03F7/20
摘要：
A system for purifying purge gases for an optical system, in particular for a projection objective for microlithography for the fabrication of semiconductor components, wherein the optical system has at least one optical element in a housing with a purge gas passing through the housing. Contaminating substances which settle on surfaces of the at least one optical element in the projection objective are filtered out by photochemical means.
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