发明申请
- 专利标题： Process to optimize properties of polymer pellicles and resist for lithography applications
- 专利标题（中）： 优化聚合物薄膜性能和光刻应用抗蚀剂的工艺
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申请号： US10799435申请日： 2004-03-12
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公开(公告)号： US20050203254A1公开(公告)日： 2005-09-15
- 发明人: Alexander Tregub , Florence Eschbach , Fu-Chang Lo , Susan Holl
- 申请人： Alexander Tregub , Florence Eschbach , Fu-Chang Lo , Susan Holl
- 主分类号： C08F114/18
- IPC分类号： C08F114/18
摘要：
Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
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