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1.发明申请Process to optimize properties of polymer pellicles and resist for lithography applications 有权优化聚合物薄膜性能和光刻应用抗蚀剂的工艺公开(公告)号：US20050203254A1
公开(公告)日：2005-09-15
申请号：US10799435
申请日：2004-03-12
申请人： Alexander Tregub , Florence Eschbach , Fu-Chang Lo , Susan Holl
发明人： Alexander Tregub , Florence Eschbach , Fu-Chang Lo , Susan Holl
IPC分类号： C08F114/18
CPC分类号： G03F1/62 , Y10T428/3154 , Y10T428/31544
摘要： Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
摘要翻译： 公开了防护薄膜组合物和制备这种防护薄膜组合物的方法。 提供的防护薄膜组合物包括高度氟化的聚合物以及氟化聚合物/ PVDF共聚物。
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公开(公告)号：US08012651B2
公开(公告)日：2011-09-06
申请号：US11957350
申请日：2007-12-14
IPC分类号： G03F9/00
CPC分类号： G03F1/64 , Y10T428/3154 , Y10T428/31544
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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公开(公告)号：US20110294048A1
公开(公告)日：2011-12-01
申请号：US13208300
申请日：2011-08-11
IPC分类号： G03F1/00
CPC分类号： G03F1/64 , Y10T428/3154 , Y10T428/31544
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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4.发明授权Process to optimize properties of polymer pellicles and resist for lithography applications 有权优化聚合物薄膜性能和光刻应用抗蚀剂的工艺公开(公告)号：US07314667B2
公开(公告)日：2008-01-01
申请号：US10799435
申请日：2004-03-12
CPC分类号： G03F1/62 , Y10T428/3154 , Y10T428/31544
摘要： Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
摘要翻译： 公开了防护薄膜组合物和制备这种防护薄膜组合物的方法。 所提供的防护薄膜组合物包括高度氟化的聚合物以及氟化聚合物/ PVDF共聚物。
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公开(公告)号：US07264853B2
公开(公告)日：2007-09-04
申请号：US10649354
申请日：2003-08-26
CPC分类号： G03F1/64 , Y10T156/10 , Y10T156/108 , Y10T428/24942
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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公开(公告)号：US20050048376A1
公开(公告)日：2005-03-03
申请号：US10649355
申请日：2003-08-26
CPC分类号： G03F1/64 , Y10T428/3154 , Y10T428/31544
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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公开(公告)号：US20050045262A1
公开(公告)日：2005-03-03
申请号：US10649354
申请日：2003-08-26
CPC分类号： G03F1/64 , Y10T156/10 , Y10T156/108 , Y10T428/24942
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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公开(公告)号：US20080094591A1
公开(公告)日：2008-04-24
申请号：US11957350
申请日：2007-12-14
IPC分类号： G03B27/52
CPC分类号： G03F1/64 , Y10T428/3154 , Y10T428/31544
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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公开(公告)号：US20060234134A1
公开(公告)日：2006-10-19
申请号：US10611070
申请日：2003-06-30
申请人： Alexander Tregub , Florence Eschbach , James Powers , Fu-Chang Lo
发明人： Alexander Tregub , Florence Eschbach , James Powers , Fu-Chang Lo
CPC分类号： G03F1/62
摘要： An embodiment of the present invention includes a technique to improve stability of a pellicle. The pellicle is pre-baked at a predetermined temperature substantially below a glass transition temperature. The pre-baked pellicle is purged with an inert gas. The purged pellicle is radiated by a radiation at a wavelength. In another embodiment, a chamber is sealed with a pellicle membrane which divides the chamber into first and second compartments. The chamber has an inflow opening in the first compartment and an outflow opening in the second compartment. A gas is injected into the inflow opening and penetrates the pellicle membrane to the outflow opening. In another embodiment, the chamber has first inflow and outflow openings and second inflow and outflow openings in the first and second compartments, respectively. A first gas is injected into the first inflow opening and a second gas into the second inflow opening. The first and second gases have a permeability difference. The first gas penetrates the pellicle membrane to the second outflow opening.
摘要翻译： 本发明的一个实施例包括提高防护薄膜的稳定性的技术。 防护薄膜组件在基本上低于玻璃化转变温度的预定温度下预烘烤。 预烘烤的防护薄膜组件用惰性气体吹扫。 被吹扫的防护薄膜组件以波长的辐射辐射。 在另一个实施例中，用隔热膜密封腔室，隔膜膜将腔室分成第一和第二隔室。 所述腔室在第一隔室中具有流入开口，并且在第二隔室中具有流出开口。 将气体注入到流入口中并将防护薄膜穿透到流出口。 在另一个实施例中，腔室分别具有第一和第二隔室中的第一流入口和第二流入口和第二流入口。 将第一气体注入第一流入口，将第二气体注入第二流入口。 第一和第二气体具有渗透率差异。 第一气体将防护薄膜穿入第二流出口。
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公开(公告)号：US08551675B2
公开(公告)日：2013-10-08
申请号：US13208300
申请日：2011-08-11
IPC分类号： G03F9/00
CPC分类号： G03F1/64 , Y10T428/3154 , Y10T428/31544
摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。
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