Invention Application
- Patent Title: Protection layers in micromirror array devices
- Patent Title (中): 微镜阵列器件中的保护层
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Application No.: US11135699Application Date: 2005-05-24
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Publication No.: US20050206993A1Publication Date: 2005-09-22
- Inventor: Jonathan Doan , Satyadev Patel , Peter Heureux
- Applicant: Jonathan Doan , Satyadev Patel , Peter Heureux
- Main IPC: G02B26/08
- IPC: G02B26/08 ; G02B26/00
Abstract:
To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.
Public/Granted literature
- US07459402B2 Protection layers in micromirror array devices Public/Granted day:2008-12-02
Information query
