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    Micromirror array assembly with in-array pillars
    1.
    发明授权
    Micromirror array assembly with in-array pillars 有权
    具有阵列支柱的微镜阵列组件

    公开(公告)号：US08693082B2

    公开(公告)日：2014-04-08

    申请号：US12853411

    申请日：2010-08-10

    Applicant: Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

    Inventor： Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

    IPC: G02B26/00 ,  G02B26/08

    CPC classification number: G02B26/0841 ,  B81C3/001 ,  Y10S359/90 ,  Y10T156/10

    Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

    Abstract translation: 本发明提供了一种微结构器件，其包括多个衬底，其中器件的部件形成在衬底上。 为了保持基板之间的间隙的均匀性，提供并分布在间隙中的多个支柱以防止间隙尺寸的减小。 可以通过将支柱结合到微结构的部件来防止间隙尺寸的增加。 或者，可以通过将间隙内的压力维持在微结构将在其中操作的压力以下来防止间隙尺寸的增加。 形成微反射镜和电极的基板的电接触可以通过许多方式制成，例如电接触区域，电接触焊盘和电接触弹簧。

    Micromirror and post arrangements on substrates
    2.
    发明授权
    Micromirror and post arrangements on substrates 有权
    基板上的微镜和柱安排

    公开(公告)号：US07697193B2

    公开(公告)日：2010-04-13

    申请号：US11853812

    申请日：2007-09-11

    Applicant: Andrew Huibers ,  Satyadev Patel

    Inventor： Andrew Huibers ,  Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

    Abstract translation: 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

    Performance Analyses of Micromirror Devices
    3.
    发明申请
    Performance Analyses of Micromirror Devices 审中-公开
    微镜器件的性能分析

    公开(公告)号：US20090190825A1

    公开(公告)日：2009-07-30

    申请号：US12360083

    申请日：2009-01-26

    Applicant: Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

    Inventor： Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

    IPC: G06K9/00 ,  G01J1/42

    CPC classification number: G01N21/55 ,  G01N21/95

    Abstract: The invention provides a method and apparatus for evaluating the product quality and performances of micromirror array devices through measurements of the electromechanical responses of the individual micromirrors to the driving forces of electric fields. The electromechanical responses of the micromirrors according to the present invention are described in terms of the rotational angles associated with the operational states, such as the ON and OFF state angles of the ON and OFF state when the micromirror array device is operated in the binary-state mode, and the response speed (i.e. the time interval required for a micromirror device to transit form one state to another) of the individual micromirrors to the driving fields.

    Abstract translation: 本发明提供一种用于通过测量各个微镜对电场驱动力的机电响应来评估微镜阵列器件的产品质量和性能的方法和装置。 根据本发明的微反射镜的机电响应以与操作状态相关联的旋转角度进行描述，例如当微镜阵列器件在二进制编码器中操作时，ON和OFF状态的ON和OFF状态角， 状态模式以及各个微镜对驱动场的响应速度（即，微镜器件从一个状态转移到另一个状态所需的时间间隔）。

    Micromirror and Post Arrangements on Substrates
    7.
    发明申请
    Micromirror and Post Arrangements on Substrates 有权
    基片上的微镜和贴片安排

    公开(公告)号：US20080049290A1

    公开(公告)日：2008-02-28

    申请号：US11853812

    申请日：2007-09-11

    Applicant: Andrew Huibers ,  Satyadev Patel

    Inventor： Andrew Huibers ,  Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

    Abstract translation: 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

    Optical coating on light transmissive substrates of micromirror devices
    8.
    发明授权
    Optical coating on light transmissive substrates of micromirror devices 有权
    微镜器件的透光基板上的光学涂层

    公开(公告)号：US07295363B2

    公开(公告)日：2007-11-13

    申请号：US11102531

    申请日：2005-04-08

    Applicant: Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

    Inventor： Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

    Abstract translation: 这里公开的是操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。

    Micromirror and post arrangements on substrates
    9.
    发明授权
    Micromirror and post arrangements on substrates 有权
    基板上的微镜和柱安排

    公开(公告)号：US07268934B2

    公开(公告)日：2007-09-11

    申请号：US11327697

    申请日：2006-01-05

    Applicant: Andrew Huibers ,  Satyadev Patel

    Inventor： Andrew Huibers ,  Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

    Abstract translation: 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

    MICROELECTROMECHANICAL STRUCTURE AND A METHOD FOR MAKING THE SAME
    10.
    发明申请
    MICROELECTROMECHANICAL STRUCTURE AND A METHOD FOR MAKING THE SAME 有权
    微电子结构及其制造方法

    公开(公告)号：US20060266730A1

    公开(公告)日：2006-11-30

    申请号：US10805610

    申请日：2004-03-18

    Applicant: Jonathan Doan ,  Satyadev Patel

    Inventor： Jonathan Doan ,  Satyadev Patel

    IPC: B44C1/22 ,  C23F1/00

    CPC classification number: B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

    Abstract: A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.

    Abstract translation: 本文公开了微结构及其制造方法。 微结构具有结构构件，其中至少一个包括金属间化合物。 在制造这样的微结构时，采用牺牲材料。 在完成形成结构层之后，牺牲材料通过自发气相化学腐蚀剂除去。

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