发明申请
US20050211276A1 Lid for a semiconductor device processing apparatus and methods for using the same
审中-公开
用于半导体器件处理装置的盖子及其使用方法
- 专利标题： Lid for a semiconductor device processing apparatus and methods for using the same
- 专利标题（中）： 用于半导体器件处理装置的盖子及其使用方法
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申请号： US11080361申请日： 2005-03-15
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公开(公告)号： US20050211276A1公开(公告)日： 2005-09-29
- 发明人: Joseph Yudovsky , Hui Chen , Gary Ettinger
- 申请人： Joseph Yudovsky , Hui Chen , Gary Ettinger
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： B08B3/02
- IPC分类号： B08B3/02 ; B08B3/12 ; B08B3/14 ; B08B13/00 ; H01L21/00
摘要：
A lid for a semiconductor device processing apparatus is provided. The lid includes a cover having an opening and may include (1) a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening; (2) an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover; (3) an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover; and/or (4) a rinsing mechanism adapted to rinse a top surface of the cover. Numerous other aspects are provided.
公开/授权文献
- US3088702A Cable retainer 公开/授权日：1963-05-07
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