公开(公告)号：US07774887B2

公开(公告)日：2010-08-17

申请号：US12102846

申请日：2008-04-14

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B7/00 ,  A47L25/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20050087212A1

公开(公告)日：2005-04-28

申请号：US10976012

申请日：2004-10-28

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth Reynolds ,  Younes Achkire ,  Dan Marohl ,  Steve Ghanayem ,  Alexander Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth Reynolds ,  Younes Achkire ,  Dan Marohl ,  Steve Ghanayem ,  Alexander Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B1/04 ,  H01L21/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20090032071A1

公开(公告)日：2009-02-05

申请号：US12245742

申请日：2008-10-04

申请人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

发明人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

IPC分类号： H01L21/67

CPC分类号： H01L21/67126 ,  B08B3/02 ,  B08B3/12 ,  B08B13/00 ,  H01L21/67051

摘要： A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided.

摘要翻译： 提供了一种用于半导体器件处理设备的盖子。 所述盖包括具有开口和围绕所述开口形成的壁的盖，所述壁适于防止存在于所述盖上的流体通过所述开口进入所述处理设备的主体，以及一个或多个盖边缘，包括一个或多个边缘壁 ; 外门，其适于防止流体通过盖的打开进入加工设备的主体，其中外门与围绕开口和一个或多个边缘壁形成的壁相连; 以及联接到所述外门并适于防止流体通过所述盖的打开而离开所述处理设备的主体的内门。 提供了许多其他方面。

公开(公告)号：US20080210258A1

公开(公告)日：2008-09-04

申请号：US12102846

申请日：2008-04-14

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B7/00 ,  A47L25/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20050211276A1

公开(公告)日：2005-09-29

申请号：US11080361

申请日：2005-03-15

申请人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

发明人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

IPC分类号： B08B3/02 ,  B08B3/12 ,  B08B3/14 ,  B08B13/00 ,  H01L21/00

CPC分类号： H01L21/67126 ,  B08B3/02 ,  B08B3/12 ,  B08B13/00 ,  H01L21/67051

摘要： A lid for a semiconductor device processing apparatus is provided. The lid includes a cover having an opening and may include (1) a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening; (2) an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover; (3) an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover; and/or (4) a rinsing mechanism adapted to rinse a top surface of the cover. Numerous other aspects are provided.

摘要翻译： 提供了一种用于半导体器件处理设备的盖子。 盖子包括具有开口的盖，并且可以包括（1）围绕开口形成的壁，所述壁适于防止存在于盖上的流体通过开口进入处理装置的主体; （2）外门，其适于防止流体通过盖的打开进入加工设备的主体; （3）内门，其联接到所述外门并且适于防止流体通过所述盖的打开而离开所述处理设备的主体; 和/或（4）适于冲洗所述盖的顶表面的冲洗机构。 提供了许多其他方面。

公开(公告)号：US20090025757A1

公开(公告)日：2009-01-29

申请号：US12245740

申请日：2008-10-04

申请人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

发明人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

IPC分类号： B08B3/04

CPC分类号： H01L21/67126 ,  B08B3/02 ,  B08B3/12 ,  B08B13/00 ,  H01L21/67051

摘要： A method of reducing sticking of a door of a semiconductor device processing apparatus is provided. The method comprises providing rinsing fluid to a lid of a semiconductor devise processing chamber so as to rinse particulates therefrom; and sliding a door that is operatively coupled to the lid so as to move between a closed position wherein the door occludes an opening formed in the lid, and an open position wherein the door does not occlude the opening. Numerous other aspects are provided.

摘要翻译： 提供一种降低半导体器件处理装置的门的粘附的方法。 该方法包括向半导体设备处理室的盖子提供冲洗流体以从其中冲洗微粒; 以及滑动可操作地联接到所述盖的门，以便在所述门闭合形成在所述盖中的开口的闭合位置与所述门不闭塞所述开口的打开位置之间移动。 提供了许多其他方面。

公开(公告)号：US07377002B2

公开(公告)日：2008-05-27

申请号：US10976012

申请日：2004-10-28

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B1/04

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20160027675A1

公开(公告)日：2016-01-28

申请号：US14774377

申请日：2014-03-14

申请人： Abraham RAVID ,  Kevin GRIFFIN ,  Joseph YUDOVSKY ,  Kaushal GANGAKHEDKAR ,  Dmitry A. DZILNO ,  Alex MINKOVICH

发明人： Abraham Ravid ,  Kevin Griffin ,  Joseph Yudovsky ,  Kaushal Gangakhedkar ,  Dmitry A. Dzilno ,  Alex Minkovich

IPC分类号： H01L21/67 ,  C23C16/458 ,  C23C16/52 ,  H01L21/687 ,  C23C16/455

CPC分类号： H01L21/67259 ,  C23C16/45544 ,  C23C16/4584 ,  C23C16/52 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/68771

摘要： Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.

摘要翻译： 描述了测量和控制基座组件和气体分配组件之间的间隙的装置和方法。 还描述了用于晶片转印目的的位置控制和温度控制的装置和方法。

公开(公告)号：US20150345022A1

公开(公告)日：2015-12-03

申请号：US14435070

申请日：2014-02-20

申请人： Joseph YUDOVSKY ,  Kevin GRIFFIN ,  Kaushal GANGAKHEDKAR

发明人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

IPC分类号： C23C16/52 ,  H01L21/285 ,  H01L21/66 ,  H01L21/02 ,  C23C16/455 ,  C23C16/458

CPC分类号： C23C16/52 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/4583 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/28556 ,  H01L22/10

摘要： Described are apparatus and methods for processing a semiconductor wafer in which the gap between the wafer surface and the gas distribution assembly remains uniform and of known thickness. The wafer is positioned within a susceptor assembly and the assembly is lifted toward the gas distribution assembly using actuators. The wafer can be lifted toward the gas distribution assembly by creating a fluid bearing below and/or above the wafer.

摘要翻译： 描述了其中晶片表面和气体分配组件之间的间隙保持均匀并具有已知厚度的半导体晶片的处理装置和方法。 晶片定位在基座组件内，并且使用致动器将组件提升到气体分配组件。 可以通过在晶片下方和/或上方产生流体轴承来将晶片提升到气体分配组件。

公开(公告)号：US20130210238A1

公开(公告)日：2013-08-15

申请号：US13789050

申请日：2013-03-07

申请人： Joseph Yudovsky

发明人： Joseph Yudovsky

IPC分类号： H01L21/02

CPC分类号： H01L21/02104 ,  C23C16/45536 ,  C23C16/45551 ,  C23C16/4584

摘要： A substrate processing chamber and methods for processing multiple substrates is provided and generally includes a plurality of spaced gas distribution assemblies and a substrate support apparatus to rotate substrates along a path adjacent each of the plurality of gas distribution assemblies. Each of the gas distribution assemblies comprises a plurality of elongate gas ports extending in a direction substantially perpendicularly to the path traversed by the substrate.

摘要翻译： 提供了一种衬底处理室和用于处理多个衬底的方法，并且通常包括多个间隔开的气体分配组件和用于沿着与多个气体分配组件中的每一个相邻的路径旋转衬底的衬底支撑设备。 每个气体分配组件包括沿基本上垂直于由衬底穿过的路径延伸的多个细长气体端口。