发明申请
- 专利标题: Apparatus for supplying gas at two different pressures
- 专利标题(中): 用于在两种不同压力下供应气体的装置
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申请号: US11091997申请日: 2005-03-29
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公开(公告)号: US20050217727A1公开(公告)日: 2005-10-06
- 发明人: Takefumi Uesugi , Daisuke Sano , Atsuhiko Kasahi , Kenji Noda
- 申请人: Takefumi Uesugi , Daisuke Sano , Atsuhiko Kasahi , Kenji Noda
- 优先权: JP2004-097126 20040329; JP2005-082545 20050322
- 主分类号: A61B1/00
- IPC分类号: A61B1/00 ; A61M13/00 ; F16L37/60 ; F16K1/00
摘要:
A gas supply apparatus is provided and has first and second fittings and first and second tubes. The first fitting is provided to discharge a gas of a first pressure therethrough, while the second fitting is provided to discharge a gas of a second pressure therethrough. The first tube has one end to which a first connector connectable to the first fitting is attached and supplies the first-pressure gas to a first body cavity of a subject. The second tube has one end to which a second connector connectable to the second fitting is attached and supplies the second-pressure gas to a second body cavity of the subject. The apparatus may comprise an erroneous-connection preventing device preventing an erroneous connection including at least one of a connection of the first connector to the second fitting and a further connection of the second connector to the first fitting.
公开/授权文献
- US07569027B2 Apparatus for supplying gas at two different pressures 公开/授权日:2009-08-04
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