发明申请
US20050218343A1 METHOD AND APPARATUS FOR SELECTIVE PRE-DISPERSION OF EXTRACTED ION BEAMS IN ION IMPLANTATION SYSTEMS
失效
用于离子植入系统中提取离子束的选择性预分散的方法和装置
- 专利标题： METHOD AND APPARATUS FOR SELECTIVE PRE-DISPERSION OF EXTRACTED ION BEAMS IN ION IMPLANTATION SYSTEMS
- 专利标题（中）： 用于离子植入系统中提取离子束的选择性预分散的方法和装置
-
申请号： US10815586申请日： 2004-04-01
-
公开(公告)号： US20050218343A1公开(公告)日： 2005-10-06
- 发明人: Victor Benveniste
- 申请人： Victor Benveniste
- 主分类号： H01J37/05
- IPC分类号： H01J37/05 ; H01J37/317
摘要：
Ion implantation systems are provided, comprising a dispersion system located between an ion source and a mass analyzer, that operates to selectively pass an extracted ion beam from the ion source toward the mass analyzer or to direct a dispersed ion beam toward the mass analyzer, where the dispersed ion beam has fewer ions of an undesired mass range than the extracted ion beam.
公开/授权文献
信息查询
