发明申请
- 专利标题: Semiconductor laser apparatus and fabrication method thereof
- 专利标题(中): 半导体激光装置及其制造方法
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申请号: US11092947申请日: 2005-03-30
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公开(公告)号: US20050220159A1公开(公告)日: 2005-10-06
- 发明人: Yasuyuki Bessho , Masayuki Hata , Daijiro Inoue , Tsutomu Yamaguchi
- 申请人: Yasuyuki Bessho , Masayuki Hata , Daijiro Inoue , Tsutomu Yamaguchi
- 专利权人: SANYO ELECTRIC CO., LTD.
- 当前专利权人: SANYO ELECTRIC CO., LTD.
- 优先权: JP2004-101487 20040330; JP2005-043388 20050221
- 主分类号: H01S5/40
- IPC分类号: H01S5/40 ; H01L29/00 ; H01S5/022
摘要:
A blue-violet semiconductor laser device has a first p-electrode formed on its upper surface and a first n-electrode formed on its lower surface. A red semiconductor laser device has a second n-electrode formed on its upper surface and a second p-electrode formed on its lower surface. An infrared semiconductor laser device has a third n-electrode formed on its upper surface and a third p-electrode formed on its lower surface. Solder films are partially formed on the upper surface of the first p-electrode in the blue-violet semiconductor laser device. Two of the solder films are formed with a predetermined distance between them on the upper surface of the first p-electrode. This results in a portion of the first p-electrode being exposed. The first, second and third p-electrodes of the blue-violet semiconductor laser device, red semiconductor laser device, and infrared semiconductor laser device are common electrodes.
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