Invention Application
US20050220271A1 Reflector rack, fabrication method thereof, and narrow band x-ray filter and system including same 失效
反射架,其制造方法和窄带x射线滤波器及包括其的系统

  • Patent Title: Reflector rack, fabrication method thereof, and narrow band x-ray filter and system including same
  • Patent Title (中): 反射架,其制造方法和窄带x射线滤波器及包括其的系统
  • Application No.: US11132305
    Application Date: 2005-05-19
  • Publication No.: US20050220271A1
    Publication Date: 2005-10-06
  • Inventor: Yong Cho
  • Applicant: Yong Cho
  • Main IPC: F21V7/00
  • IPC: F21V7/00 G21K1/10 G21K3/00
Reflector rack, fabrication method thereof, and narrow band x-ray filter and system including same
Abstract:
A stackable rack may comprise: at least two rails, a cross-section of each rail having a shape resembling a staircase, first step portion of which represents a first surface upon which a reflector can be disposed; and a second step portion of which represents a second surface which can support another rail. A method of making a narrow band x-ray filter may comprise: providing a substrate; and stacking one or more reflection units in succession upon the substrate, each reflection unit including a rack (such as mentioned above) and a reflector held by the rack. An apparatus to produce a substantially narrow band x-ray beam may include such a filter. An apparatus to make an x-ray image of a subject may include: the apparatus to produce a substantially narrow band x-ray beam, e.g., as set forth above, and an x-ray detector arranged to receive the narrow band x-ray.
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