Disclosed is a silver halide photographic material containing a nonionic fluorine compound of formula (1) and an anionic fluorine compound of formula (2). The silver halide photographic material has good static resistance and excellent antistatic properties. (1): C4F9—CH2CH(OH)CH2—(OCH2CH2)m—OCnH2n+1 wherein m is 15-40; n is 8-24; (2): wherein R11-R13 are H or substituent; n1 and n2 are 4-8; L11 and L12 are alkylene, alkyleneoxy, or linking group; m11 is 0-1; M1 is cation.