发明申请
- 专利标题: Plasma resistant member
- 专利标题(中): 等离子体元件
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申请号: US11149358申请日: 2005-06-10
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公开(公告)号: US20050227118A1公开(公告)日: 2005-10-13
- 发明人: Tomonori Uchimaru , Haruo Murayama , Takashi Tanaka , Keiji Morita , Akira Miyazaki
- 申请人: Tomonori Uchimaru , Haruo Murayama , Takashi Tanaka , Keiji Morita , Akira Miyazaki
- 申请人地址: JP Tokyo
- 专利权人: Toshiba Ceramics Co., Ltd.
- 当前专利权人: Toshiba Ceramics Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2001-099159 20010330; JP2002-060816 20020306
- 主分类号: H05H1/46
- IPC分类号: H05H1/46 ; B32B18/00 ; C04B35/44 ; C04B35/50 ; C04B35/505 ; C04B41/52 ; C04B41/89 ; C23C14/00 ; C23C16/44 ; H01J37/32 ; H01L21/205 ; H01L21/302 ; B32B9/00
摘要:
The present invention provides a plasma resistant member having a reinforced mechanical strength and being sufficiently durable to exposure to a low pressure high density plasma. At least the surface of the alumina based material is formed of an oxide or composite oxide layer of a group IIIA element via an intermediate layer. It is preferable in the construction of the plasma resistant member that the intermediate layer comprises 10 to 80% by weight of the oxide or composite oxide of the group IIIA element in the periodic table and 90 to 20% by weight of alumina. The intermediate layer may also comprise a course ceramic with a porosity of 0.2 to 5%. It is also desirable that at least one of the conditions such as a difference in the thermal shrinkage ratio at 1600 to 1900° C. of 3% or less is provided.
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