发明申请
- 专利标题： Method for cleaning the surface of a substrate
- 专利标题（中）： 洗涤基材表面的方法
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申请号： US11072139申请日： 2005-03-04
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公开(公告)号： US20050230344A1公开(公告)日： 2005-10-20
- 发明人: Frank Koschinsky , Volker Kahlert , Peter Huebler
- 申请人： Frank Koschinsky , Volker Kahlert , Peter Huebler
- 优先权： DE102004015865.7 20040331
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L21/283 ; H01L21/302 ; H01L21/768
摘要：
A cleaning process for cleaning the surface of a substrate is disclosed, wherein the surface comprises portions of a dielectric material and portions of a conductive material. According to the method disclosed, the temperature at the surface of the substrate is kept below a predefined value during the actual cleaning step in a reactive and/or inert plasma ambient, such as an argon gas ambient, wherein the predefined value corresponds to the surface temperature at which agglomeration of the conductive material occurs.
公开/授权文献
- US07063091B2 Method for cleaning the surface of a substrate 公开/授权日：2006-06-20
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