发明申请
US20050230882A1 Method of forming a deep-featured template employed in imprint lithography
审中-公开
形成压印光刻中使用的深度特征模板的方法
- 专利标题： Method of forming a deep-featured template employed in imprint lithography
- 专利标题（中）： 形成压印光刻中使用的深度特征模板的方法
-
申请号： US10827118申请日： 2004-04-19
-
公开(公告)号： US20050230882A1公开(公告)日： 2005-10-20
- 发明人: Michael Watts , Nicholas Stacey , Michael Miller
- 申请人： Michael Watts , Nicholas Stacey , Michael Miller
- 申请人地址： US TX Austin
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 当前专利权人地址： US TX Austin
- 主分类号： B29C35/08
- IPC分类号： B29C35/08 ; B44C1/165 ; G03F7/00
摘要：
The present invention is directed to a method of forming a pattern on a plate employing a mold. The method includes placing the plate in superimposition with said mold. Formable material is positioned between that plate and the mold. A pattern is formed in the formable material having a shape complementary to the shape of the mold, defining patterned material. The patterned material is then adhered to the plate.
信息查询
IPC分类:
