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    Imprint lithography template having a coating to reflect and/or absorb actinic energy
    2.
    发明申请
    Imprint lithography template having a coating to reflect and/or absorb actinic energy 审中-公开
    具有反射和/或吸收光化能的涂层的印记光刻模板

    公开(公告)号：US20060266916A1

    公开(公告)日：2006-11-30

    申请号：US11136897

    申请日：2005-05-25

    申请人： Michael Miller ,  Edward Fletcher ,  Nicholas Stacey ,  Michael Watts ,  Ian McMackin

    发明人： Michael Miller ,  Edward Fletcher ,  Nicholas Stacey ,  Michael Watts ,  Ian McMackin

    IPC分类号： B29C35/12

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed towards a template, transmissive to energy having a predetermined wavelength, having first and second opposed sides and features a coating disposed thereon to limit the volume of the template through which the energy may propagate. In a first embodiment, the template includes, inter alia, a mold, having a plurality of protrusions and recessions, positioned on a first region of the first side; and a coating positioned upon a second region of the first side, with the coating having properties to block the energy from propagating between the first and second opposed sides.

    摘要翻译： 本发明涉及一种对具有预定波长的能量透射的模板，其具有第一和第二相对侧，并且具有设置在其上的涂层，以限制能量可以传播的模板的体积。 在第一实施例中，模板尤其包括定位在第一侧的第一区域上的具有多个突起和凹陷的模具; 以及位于所述第一侧的第二区域上的涂层，所述涂层具有阻挡能量在所述第一和第二相对侧之间传播的性质。

    Method of forming a deep-featured template employed in imprint lithography
    3.
    发明申请
    Method of forming a deep-featured template employed in imprint lithography 审中-公开
    形成压印光刻中使用的深度特征模板的方法

    公开(公告)号：US20050230882A1

    公开(公告)日：2005-10-20

    申请号：US10827118

    申请日：2004-04-19

    申请人： Michael Watts ,  Nicholas Stacey ,  Michael Miller

    发明人： Michael Watts ,  Nicholas Stacey ,  Michael Miller

    IPC分类号： B29C35/08 ,  B44C1/165 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed to a method of forming a pattern on a plate employing a mold. The method includes placing the plate in superimposition with said mold. Formable material is positioned between that plate and the mold. A pattern is formed in the formable material having a shape complementary to the shape of the mold, defining patterned material. The patterned material is then adhered to the plate.

    摘要翻译： 本发明涉及一种在使用模具的板上形成图案的方法。 该方法包括将板放置在与所述模具重叠的位置。 可成型材料位于该板和模具之间。 在具有与模具形状互补的形状的成形材料中形成图案，限定图案化材料。 然后将图案化的材料粘附到板上。

    Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition
    7.
    发明申请
    Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition 审中-公开
    在模具和可聚合组合物之间提供所需润湿和释放特性的方法

    公开(公告)号：US20060279024A1

    公开(公告)日：2006-12-14

    申请号：US11459797

    申请日：2006-07-25

    申请人： Byung-Jin Choi ,  Frank Xu ,  Nicholas Stacey ,  Van Truskett ,  Michael Watts

    发明人： Byung-Jin Choi ,  Frank Xu ,  Nicholas Stacey ,  Van Truskett ,  Michael Watts

    IPC分类号： B28B7/36

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.

    摘要翻译： 本发明提供一种降低基材上的适形区域和选择性地与适形区域接触的模具图案之间的粘附性的方法。 该方法的特征在于在基底上形成适形材料并使适形材料与表面接触。 由适形材料形成调理层。 调理层具有第一和第二子部分，其中第一子部分被固化，第二子部分对于表面具有第一亲和力，对第一子部分具有第二亲和力。 第一亲和力大于第二亲和力。 以这种方式，在模具与调理层分离时，第二子部分的子集保持与模具的接触，从而降低在调理层中形成的图案变得损害的可能性。

    Methods for fabricating patterned features utilizing imprint lithography
    9.
    发明申请
    Methods for fabricating patterned features utilizing imprint lithography 有权
    使用压印光刻制造图案特征的方法

    公开(公告)号：US20050100830A1

    公开(公告)日：2005-05-12

    申请号：US10694284

    申请日：2003-10-27

    申请人： Frank Xu ,  Nicholas Stacey ,  Michael Watts ,  Ecron Thompson

    发明人： Frank Xu ,  Nicholas Stacey ,  Michael Watts ,  Ecron Thompson

    IPC分类号： G03C5/00 ,  G03F7/00 ,  H01L21/302 ,  H01L21/461

    CPC分类号： B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.

    摘要翻译： 本发明的一个实施例是一种用于在衬底上产生图案化特征的方法，其包括：（a）在衬底的表面的至少一部分上形成第一层，第一层包括至少一层第一材料 其中一层邻接衬底的表面; （b）在所述第一层的至少一部分上形成第二材料的第二层，所述第二层被印刷所述图案化特征; （c）去除所述第二层的至少一部分以将所述图案化特征延伸到所述第一层; 和（d）去除所述第一层的至少一部分以将所述图案化特征延伸到所述基底; 其中第一层和第二层可以暴露于蚀刻过程，其蚀刻图案化的特征，并且第一材料可以被剥离。

    Materials for imprint lithography
    10.
    发明申请
    Materials for imprint lithography 有权
    压印光刻材料

    公开(公告)号：US20050187339A1

    公开(公告)日：2005-08-25

    申请号：US10784911

    申请日：2004-02-23

    申请人： Frank Xu ,  Michael Watts ,  Nicholas Stacey

    发明人： Frank Xu ,  Michael Watts ,  Nicholas Stacey

    IPC分类号： C08J7/16 ,  C08J7/18 ,  C08K3/00 ,  C08K5/54 ,  C08K5/541 ,  C09D11/10

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/101

    摘要： The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.

    摘要翻译： 本发明涉及一种用于压印光刻的材料，其特征在于具有与之相关的粘度的组合物，并且包括表面活性剂，可聚合组分和响应于刺激物的引发剂以响应于其而改变粘度， 在液体状态下，其粘度低于约100厘泊，蒸气压小于约20托，并且在固体固化状态下，拉伸模量大于约100MPa，断裂应力大于约3MPa 并且断裂伸长率大于约2％。