发明申请
- 专利标题: Exposure device
- 专利标题(中): 曝光装置
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申请号: US11147161申请日: 2005-06-08
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公开(公告)号: US20050231696A1公开(公告)日: 2005-10-20
- 发明人: Takao Ozaki , Koji Wada
- 申请人: Takao Ozaki , Koji Wada
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JP2002-332201 20021115
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G01B11/00 ; G02B26/10 ; G03B27/42 ; G03B27/48 ; G03B27/54 ; G03B27/58 ; G03F7/20 ; H04N1/04 ; H05K1/02 ; H05K3/00
摘要:
A laser exposure device at which alignment marks of a plate material on an exposure stage, which is moving in a direction opposite to a scanning direction, are read by a CCD camera mounted at a support gate, after which an imaging region, whose position is judged using the alignment marks, is exposed by a laser beam from a laser scanner. Here, a distance along the scanning direction from the CCD camera to the laser scanner is not less than a pitch of the alignment marks that are provided to respectively correspond to a trailing end and a leading end of the imaging region. According to this laser exposure device, even in a case in which a plurality of the imaging region is provided at a recording medium, an increase in a duration for forming images on the recording medium in accordance with an increase in imaging regions is prevented.
公开/授权文献
- US07057706B2 Exposure device 公开/授权日:2006-06-06
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