发明申请
- 专利标题: Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material
- 专利标题(中): 在热敏正性平版印刷版材料上精确曝光小点的方法
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申请号: US11114210申请日: 2005-04-21
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公开(公告)号: US20050235854A1公开(公告)日: 2005-10-27
- 发明人: Joan Vermeersch , Wim Sap , Marc Damme
- 申请人: Joan Vermeersch , Wim Sap , Marc Damme
- 申请人地址: BE Mortsel B2640
- 专利权人: AGFA-GEVAERT N.V.
- 当前专利权人: AGFA-GEVAERT N.V.
- 当前专利权人地址: BE Mortsel B2640
- 优先权: EP04101647.8 20040421
- 主分类号: B41C1/10
- IPC分类号: B41C1/10
摘要:
A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.
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