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    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material
    1.
    发明申请
    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material 有权
    在热敏正性平版印刷版材料上精确曝光小点的方法

    公开(公告)号：US20050235854A1

    公开(公告)日：2005-10-27

    申请号：US11114210

    申请日：2005-04-21

    申请人： Joan Vermeersch ,  Wim Sap ,  Marc Damme

    发明人： Joan Vermeersch ,  Wim Sap ,  Marc Damme

    IPC分类号： B41C1/10

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.

    摘要翻译： 公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。 这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。 已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上物理区域由能量密度 在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。 因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。 从而避免由于过度曝光导致的微点损失。

    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material
    2.
    发明授权
    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material 有权
    在热敏正性平版印刷版材料上精确曝光小点的方法

    公开(公告)号：US07467587B2

    公开(公告)日：2008-12-23

    申请号：US11114210

    申请日：2005-04-21

    申请人： Joan Vermeersch ,  Wim Sap ,  Marc Van Damme

    发明人： Joan Vermeersch ,  Wim Sap ,  Marc Van Damme

    IPC分类号： B41C1/10 ,  B41M1/06 ,  G03F7/00

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.

    摘要翻译： 公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。 这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。 已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上的物理区域的能量密度，由 在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。 因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。 从而避免由于过度曝光导致的微点损失。

    Positive-working lithographic printing plate precursor
    4.
    发明申请
    Positive-working lithographic printing plate precursor 审中-公开
    正版平版印刷版前体

    公开(公告)号：US20070077513A1

    公开(公告)日：2007-04-05

    申请号：US10583542

    申请日：2004-12-08

    申请人： Paola Campestrini ,  Joan Vermeersch ,  Marc Damme

    发明人： Paola Campestrini ,  Joan Vermeersch ,  Marc Damme

    IPC分类号： G03C1/00

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41N1/083 ,  B41N3/00 ,  B41N3/034 ,  B41N3/038

    摘要： A positive-working lithographic printing plate precursor is disclosed which comprises (i) a grained and anodized aluminum support having a hydrophilic surface and (ii) a heat-sensitive oleophilic coating provided on the hydrophilic surface, wherein said coating comprises (a) a hydrophobic polymer which is soluble in an aqueous alkaline developer and (b) a dissolution inhibitor which is a water-repellent polymer and wherein said coating is capable of dissolving in said developer at a higher dissolution rate in areas of said coating which are exposed to heat or infrared light than in unexposed areas, characterized in that the hydrophilic surface has a surface roughness, measured according to ISO 4288 and expressed as arithmetical mean center-line roughness Ra′, which is less than 0.40 μm and the hydrophilic surface comprises a salt of titanium, hafnium or zirconium. A hydrophilic surface, which has a low surface roughness and contains a salt of titanium, hafnium or zirconium, is used to obtain an improved sensitivity of the coating with a reduced staining and an increased printing run length.

    摘要翻译： 公开了一种正性平版印刷版前体，其包括（i）具有亲水表面的颗粒和阳极氧化铝载体和（ii）在亲水表面上提供的热敏亲油涂层，其中所述涂层包含（a）疏水性 可溶于碱性显影液的聚合物和（b）作为拒水聚合物的溶解抑制剂，其中所述涂层能够以较高的溶解速率溶解在所述显影剂中，所述涂层暴露于热或 其特征在于亲水表面具有根据ISO 4288测量的表面粗糙度，并表示为小于0.40μm的算术平均中心线粗糙度Ra'，并且亲水表面包含钛的盐 ，铪或锆。 使用具有低表面粗糙度并含有钛，铪或锆的盐的亲水性表面，以减少染色和增加的印刷行程长度来获得涂层的改善的敏感性。

    Negative working, heat sensitive lithographic printing plate precursor
    6.
    发明授权
    Negative working, heat sensitive lithographic printing plate precursor 有权
    负工作，热敏平版印刷版前体

    公开(公告)号：US08216769B2

    公开(公告)日：2012-07-10

    申请号：US12300805

    申请日：2007-05-22

    申请人： Hieronymus Andriessen ,  Steven Lezy ,  Hubertus Van Aert ,  Joan Vermeersch

    发明人： Hieronymus Andriessen ,  Steven Lezy ,  Hubertus Van Aert ,  Joan Vermeersch

    IPC分类号： G03F7/09 ,  G03F7/26 ,  B41N1/08

    CPC分类号： B41C1/1025 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145

    摘要： A heat-sensitive negative-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye; wherein the hydrophobic thermoplastic polymer particles have an average particle diameter, measured by Photon Correlation Spectroscopy, of more than 10 nm and less than 40 nm; the amount of the IR-dye, without taking into account an optional counter ion, is more than 0.80 mg per m2 of the total surface of the thermoplastic polymer particles, measured by Hydrodynamic Fractionation; and the amount of hydrophobic thermoplastic polymer particles relative to the total weight of the ingredients of the imaging layer is at least 60%.

    摘要翻译： 热敏负性平版印刷版原版包括具有亲水性表面的或具有亲水层的涂层及其上设置的涂层，所述涂层包括图像记录层，该图像记录层包括疏水性热塑性聚合物颗粒，粘合剂， 和红外吸收染料; 其中所述疏水热塑性聚合物颗粒具有通过光子相关光谱测量的平均粒径大于10nm且小于40nm; 通过流体力学分级测量，不考虑任选的抗衡离子的IR染料的量大于0.80mg / m 2热塑性聚合物颗粒的总表面; 并且疏水性热塑性聚合物颗粒相对于成像层的成分的总重量的量为至少60％。

    Method for making a lithographic printing plate
    9.
    发明申请
    Method for making a lithographic printing plate 有权
    平版印刷版的制造方法

    公开(公告)号：US20060014103A1

    公开(公告)日：2006-01-19

    申请号：US11173466

    申请日：2005-06-30

    申请人： Joan Vermeersch ,  Pascal Meeus ,  Dirk Kokkelenberg

    发明人： Joan Vermeersch ,  Pascal Meeus ,  Dirk Kokkelenberg

    IPC分类号： G03F7/00

    CPC分类号： B41C1/1025 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145

    摘要： A method for making a lithographic printing plate is disclosed which comprises the steps of: (i) providing a negative-working, heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating comprising an image-recording layer which comprises hydrophobic thermoplastic polymer particles and a hydrophilic binder, wherein the hydrophobic thermoplastic polymer particles have an average particle size in the range from 45 nm to 63 nm and wherein the amount of the hydrophobic thermoplastic polymer particles in the image-recording layer is at least 70% by weight relative to the image-recording layer; (ii) exposing the coating to heat or infrared light, thereby inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; (iii) developing the precursor by applying an aqueous, alkaline solution, thereby removing non-exposed areas of the coating from the support, wherein the aqueous alkaline solution has a pH≧11 and comprises a phosphate buffer or a silicate buffer.

    摘要翻译： 公开了一种制备平版印刷版的方法，其包括以下步骤：（i）提供负性工作的热敏平版印刷版原版，其包含具有亲水性表面的支持体或设有亲水层和涂层 提供在其上的涂层包括包含疏水性热塑性聚合物颗粒和亲水性粘合剂的图像记录层，其中所述疏水性热塑性聚合物颗粒的平均粒度在45nm至63nm的范围内，并且其中所述疏水性热塑性聚合物的量 图像记录层中的聚合物颗粒相对于图像记录层为至少70重量％ （ii）将涂层暴露于热或红外光，从而在涂层的暴露区域引起热塑性聚合物颗粒的聚结; （iii）通过施加水性碱性溶液来显影前体，从而从载体除去涂层的未曝光区域，其中碱性水溶液的pH> = 11且包含磷酸盐缓冲液或硅酸盐缓冲液。

    Method of emulsion polymerization
    10.
    发明申请
    Method of emulsion polymerization 审中-公开

    公开(公告)号：US20060009574A1

    公开(公告)日：2006-01-12

    申请号：US11223521

    申请日：2005-09-09

    申请人： Huub Aert ,  Joan Vermeersch ,  Etienne Thillo ,  Jos Huybrechts

    发明人： Huub Aert ,  Joan Vermeersch ,  Etienne Thillo ,  Jos Huybrechts

    IPC分类号： C08K3/00

    CPC分类号： C09D11/106 ,  C08F2/22 ,  C08F2/38 ,  C08F120/14 ,  C08F2438/03 ,  C09D11/107 ,  C08F212/06 ,  C08F220/54 ,  C08F220/44 ,  C08F212/08

    摘要： A method has been disclosed of preparing ultrafine hydrophobic latex particles of polymers and copolymers by free radical emulsion polymerization in a water-based system, making use therefor, in order to polymerize or copolymerize monomers or monomer mixtures respectively, of at least one compound selected from the group consisting of dimers and cobalt complexes, acting as a chain transfer agent (CTA), wherein said latex particles have an average particle size of less than 100 nm, being more than 10% lower than if prepared in the absence of said CTA, characterized in that said polymerization is conducted in a water-based reaction in the presence of a chain transfer agent and of a surfactant, wherein said surfactant is present in a concentration versus said monomer or monomer mixture of from 5 up to 25% by weight for a non-ionic surfactant or from 0.05 up to 10% by weight for an ionic surfactant, more particularly a surfactant in a concentration below twice its critical micelle concentration.