发明申请
- 专利标题: Charged particle beam adjusting method and charged particle beam apparatus
- 专利标题(中): 带电粒子束调节法和带电粒子束装置
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申请号: US11104631申请日: 2005-04-13
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公开(公告)号: US20050236570A1公开(公告)日: 2005-10-27
- 发明人: Hidetoshi Morokuma , Noriaki Arai , Takashi Doi , Fumihiro Sasajima , Yoshihiro Kimura
- 申请人: Hidetoshi Morokuma , Noriaki Arai , Takashi Doi , Fumihiro Sasajima , Yoshihiro Kimura
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 优先权: JP2004-127519 20040423
- 主分类号: G21K5/04
- IPC分类号: G21K5/04 ; G21K1/08 ; G21K7/00 ; H01J37/153
摘要:
In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.
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