发明申请
US20050236645A1 STRUCTURE AND METHOD OF FORMING BIPOLAR TRANSISTOR HAVING A SELF-ALIGNED RAISED EXTRINSIC BASE USING SELF-ALIGNED ETCH STOP LAYER
有权
使用自对准蚀刻停止层形成具有自对准基极化基底的双极晶体管的结构和方法
- 专利标题: STRUCTURE AND METHOD OF FORMING BIPOLAR TRANSISTOR HAVING A SELF-ALIGNED RAISED EXTRINSIC BASE USING SELF-ALIGNED ETCH STOP LAYER
- 专利标题(中): 使用自对准蚀刻停止层形成具有自对准基极化基底的双极晶体管的结构和方法
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申请号: US10709220申请日: 2004-04-22
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公开(公告)号: US20050236645A1公开(公告)日: 2005-10-27
- 发明人: Marwan Khater , Francois Pagette
- 申请人: Marwan Khater , Francois Pagette
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L21/331
- IPC分类号: H01L21/331 ; H01L29/10 ; H01L29/417 ; H01L29/423 ; H01L29/732 ; H01L29/737 ; H01L31/0328 ; H01L31/0336 ; H01L31/072
摘要:
A bipolar transistor structure and method of making the bipolar transistor are provided. The bipolar transistor includes a collector region, an intrinsic base layer overlying the collector region, and an emitter overlying the intrinsic base layer. An opened etch stop layer includes a layer of dielectric material overlying the intrinsic base, the opened etch stop layer self-aligned to the emitter. The bipolar transistor further includes a raised extrinsic base self-aligned to the emitter, the raised extrinsic base overlying the intrinsic base layer.
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