发明申请
- 专利标题: Producing a substrate having high surface-area texturing
- 专利标题(中): 生产具有高表面积纹理的基材
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申请号: US11092540申请日: 2005-03-29
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公开(公告)号: US20050242059A1公开(公告)日: 2005-11-03
- 发明人: Reid Brennen , Sally Swedberg
- 申请人: Reid Brennen , Sally Swedberg
- 主分类号: B23K26/06
- IPC分类号: B23K26/06 ; B23K26/36 ; G01N30/60 ; B44C1/22 ; H01L21/306
摘要:
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High surface-area textured substrates, in particular, miniaturized planar analysis devices having high surface-area textured features, prepared by the methods disclosed herein, are also provided. A method by which the high surface-area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.
公开/授权文献
- US07354695B2 Producing a substrate having high surface-area texturing 公开/授权日:2008-04-08