发明申请
- 专利标题： Apparatus and method for inspecting pattern on object
- 专利标题（中）： 检查物体图案的装置和方法
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申请号： US11097139申请日： 2005-04-04
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公开(公告)号： US20050244049A1公开(公告)日： 2005-11-03
- 发明人: Hiroyuki Onishi , Yasushi Sasa , Manabu Tsujimura , Toshifumi Kinba , Katsuya Okumura
- 申请人： Hiroyuki Onishi , Yasushi Sasa , Manabu Tsujimura , Toshifumi Kinba , Katsuya Okumura
- 专利权人： DAINIPPON SCREEN MFG.CO., LTD.,EBARA CORPORATION
- 当前专利权人： DAINIPPON SCREEN MFG.CO., LTD.,EBARA CORPORATION
- 优先权： JPP2004-135054 20040430
- 主分类号： G01N23/225
- IPC分类号： G01N23/225 ; G06K9/00 ; G06T1/00 ; G06T5/00 ; G06T7/00 ; H01L21/66
摘要：
In a pattern inspection apparatus (1), an electron beam emission part (31) emits an electron beam onto a substrate (9) and an image acquisition part (33) detects electrons from the substrate (9) to acquire a grayscale inspection image of the substrate (9). A binary reference image generated from design data (81) is multivalued by a grayscale image generator (52) on the basis of a histogram of pixel values in the inspection image to generate a grayscale reference image. A comparator (53) compares the inspection image with the reference image. The pattern inspection apparatus (1) can thereby perform an inspection of a very small pattern on the substrate (9) on the basis of the design data (81).
信息查询
