发明申请
US20050247341A1 System for supplying halogen gas or halogen containing gas and method thereof
有权
用于提供卤素气体或含卤素气体的系统及其方法
- 专利标题: System for supplying halogen gas or halogen containing gas and method thereof
- 专利标题(中): 用于提供卤素气体或含卤素气体的系统及其方法
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申请号: US11033117申请日: 2005-01-12
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公开(公告)号: US20050247341A1公开(公告)日: 2005-11-10
- 发明人: Tetsuro Tojo , Jiro Hiraiwa , Osamu Yoshimoto
- 申请人: Tetsuro Tojo , Jiro Hiraiwa , Osamu Yoshimoto
- 申请人地址: JP Osaka-shi
- 专利权人: Toyo Tanso Co., Ltd.
- 当前专利权人: Toyo Tanso Co., Ltd.
- 当前专利权人地址: JP Osaka-shi
- 优先权: JP2003-270370 20030702
- 主分类号: F17C7/00
- IPC分类号: F17C7/00 ; F04F1/00 ; F17C9/00 ; F17C13/02
摘要:
Since the system for supplying gas comprises a storage container, a compressor which pressurizes fluorine gas in the storage container, and a pressurized storing container which presses fit and stores the fluorine gas, by supplying fluorine gas or the like to the destination from this system for supplying gas, it is not necessary to change gas source such as a gas cylinder or the like. In this way, fluorine gas or the like can be supplied to the destination inexpensively and safely.
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