Invention Application
- Patent Title: Lithographic apparatus, article support member, and method
- Patent Title (中): 平版印刷设备，文章支持成员和方法
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Application No.: US10837914Application Date: 2004-05-04
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Publication No.: US20050248746A1Publication Date: 2005-11-10
- Inventor: Koen Jacobus Zaal , Aschwin Lodewijk Van Meer , Joost Ottens
- Applicant: Koen Jacobus Zaal , Aschwin Lodewijk Van Meer , Joost Ottens
- Applicant Address: NL La Veldhoven
- Assignee: ASML NETHERLAND B.V.
- Current Assignee: ASML NETHERLAND B.V.
- Current Assignee Address: NL La Veldhoven
- Main IPC: H01L21/683
- IPC: H01L21/683 ; G03B27/62 ; G03F7/20 ; H01L21/027 ; H01L21/68
Abstract:
A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.
Public/Granted literature
- US07133120B2 Lithographic apparatus, article support member, and method Public/Granted day:2006-11-07
Information query
IPC分类:
