公开(公告)号：US20210357566A1

公开(公告)日：2021-11-18

申请号：US17281123

申请日：2019-10-08

申请人： ASML NETHERLAND B.V.

发明人： Mark Christopher SIMMONS ,  Chenxi LIN ,  Jen-Yi WUU

IPC分类号： G06F30/392 ,  G03F7/20 ,  G06N3/08 ,  G06N3/04

摘要： A method of generating a characteristic pattern for a patterning process and training a machine learning model. The method for generating the characteristic pattern includes obtaining a trained generator model configured to generate a characteristic pattern (e.g., a hot spot pattern), and an input pattern; and generating, via simulation using the trained generator model (e.g., CNN), the characteristic pattern based on the input pattern, wherein the input pattern can be a random vector and/or a class of pattern.

公开(公告)号：US09835950B2

公开(公告)日：2017-12-05

申请号：US15112602

申请日：2014-12-19

申请人： ASML Netherlands B.V.

发明人： Markus Franciscus Antonius Eurlings ,  Niek Antonius Jacobus Maria Kleemans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Ramon Mark Hofstra ,  Oscar Franciscus Jozephus Noordman ,  Tien Nang Pham ,  Jan Bernard Plechelmus Van Schoot ,  Jiun-Cheng Wang ,  Kevin Weimin Zhang

IPC分类号： G03B27/54 ,  G03B27/72 ,  H05G2/00 ,  G03F7/20 ,  G02B27/09 ,  G02B19/00

CPC分类号： G03F7/70091 ,  G02B19/0019 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/005 ,  H05G2/008

摘要： A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

公开(公告)号：US20150015863A1

公开(公告)日：2015-01-15

申请号：US14383359

申请日：2013-02-07

申请人： ASML Netherland B.V.

发明人： Antonius Theodorus Wilhelmus Kempen ,  John Frederik Dijkusman ,  Jan Jan Meastrom

IPC分类号： H05G2/00 ,  B05B17/06 ,  G03F7/20

CPC分类号： H05G2/006 ,  B05B17/0653 ,  G03F7/70033 ,  G03F7/70058 ,  G03F7/7085 ,  G03F7/709 ,  G03F7/70916

摘要： The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analysing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.

摘要翻译： 本发明提供一种监测包括含燃料毛细管和压电致动器（500）的辐射源燃料液滴流发生器的操作的方法。 该方法包括分析包括含燃料的毛细管和压电致动器的系统的共振频谱，以寻找声学系统的共振频率的变化，其可以指示系统的性质的变化 需要调查。

公开(公告)号：US20140098357A1

公开(公告)日：2014-04-10

申请号：US14107734

申请日：2013-12-16

申请人： ASML NETHERLAND B.V.

发明人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US07804584B2

公开(公告)日：2010-09-28

申请号：US12262647

申请日：2008-10-31

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03F9/00

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。

公开(公告)号：US20090284715A1

公开(公告)日：2009-11-19

申请号：US12428237

申请日：2009-04-22

申请人： Robert Douglas Watso ,  Youri Johannes Laurentius Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Anthonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

发明人： Robert Douglas Watso ,  Youri Johannes Laurentius Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Anthonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

摘要翻译： 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体发泡。 还公开了热隔离岛的使用以及其最佳位置。

公开(公告)号：US20080246940A1

公开(公告)日：2008-10-09

申请号：US11730751

申请日：2007-04-03

申请人： Jan Bernard Plechelmus Van Schoot ,  Hendricus Johannes Maria Meijer

发明人： Jan Bernard Plechelmus Van Schoot ,  Hendricus Johannes Maria Meijer

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70833 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70808

摘要： An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.

摘要翻译： 照明系统包括壳体和位于壳体内的光学系统。 光学系统包括至少一个光学元件。 光学系统被构造和布置成用从中间焦点分散的辐射束照射图案形成装置。 中间焦点位于基本上在照明系统的底部的相同水平或低于底部的位置处。

公开(公告)号：US20070285631A1

公开(公告)日：2007-12-13

申请号：US11437876

申请日：2006-05-22

申请人： Marco Koert Stavenga ,  Hans Jansen ,  Peter Franciscus Wanten ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren

发明人： Marco Koert Stavenga ,  Hans Jansen ,  Peter Franciscus Wanten ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren

IPC分类号： G03B27/52 ,  B08B3/12 ,  B08B6/00

CPC分类号： H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.

摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用兆声波清洁浸没式光刻投影设备的表面的方法。

公开(公告)号：US11982947B2

公开(公告)日：2024-05-14

申请号：US18070155

申请日：2022-11-28

申请人： ASML Netherlands B.V.

发明人： Sander Catharina Reinier Derks ,  Daniel Jozef Maria Direcks ,  Maurice Wilhelmus Leonardus Hendricus Feijts ,  Pieter Gerardus Mathijs Hoeijmakers ,  Katja Cornelia Joanna Clasina Moors ,  Violeta Navarro Paredes ,  William Peter Van Drent ,  Jan Steven Christiaan Westerlaken

IPC分类号： G03F7/00 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70891 ,  H05G2/005 ,  H05G2/008

摘要： A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US11846879B2

公开(公告)日：2023-12-19

申请号：US17982226

申请日：2022-11-07

申请人： ASML NETHERLANDS B.V.

发明人： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC分类号： G03F7/00

CPC分类号： G03F7/70725 ,  G03F7/70775

摘要： A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.