发明申请
US20050258380A1 High aspect ratio, high mass resolution analyzer magnet and system for ribbon ion beams 有权
高纵横比,高质量分辨率分析仪磁体和带状离子束系统

  • 专利标题: High aspect ratio, high mass resolution analyzer magnet and system for ribbon ion beams
  • 专利标题(中): 高纵横比,高质量分辨率分析仪磁体和带状离子束系统
  • 申请号: US11123924
    申请日: 2005-05-06
  • 公开(公告)号: US20050258380A1
    公开(公告)日: 2005-11-24
  • 发明人: Nicholas WhiteJiong Chen
  • 申请人: Nicholas WhiteJiong Chen
  • 主分类号: H01J37/05
  • IPC分类号: H01J37/05 H01J37/317 H01J49/20
High aspect ratio, high mass resolution analyzer magnet and system for ribbon ion beams
摘要:
The present invention provides a windowframe magnet having an aligned array of paired bedstead coils in mirror symmetry can bend a high aspect ratio ribbon ion beam through angle of not less than about 45 degrees and not more than about 110 degrees, and can focus it through a resolving slot for mass analysis. The long transverse axis of the beam, which can exceed 50% of the bend radius, is aligned with the generated magnetic field. The array of paired bedstead coils provide tight control of the fringing fields, present intrinsically good field uniformity, and enable a manufacture of much lighter construction than other magnet styles conventionally in use in the ion implantation industry. Within the system of the present invention, the ribbon beam is refocused with low aberration to achieve high resolving power, which is of significant value in the ion implantation industry. System size is further reduced by using a small ion source and a quadrupole lens to collimate the beam after expansion and analysis. There is no fundamental limit to the aspect ratio of the beam that can be analyzed.
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