发明申请
- 专利标题: Flow field plate arrangement
- 专利标题(中): 流场板排列
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申请号: US10944834申请日: 2004-09-21
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公开(公告)号: US20050260482A1公开(公告)日: 2005-11-24
- 发明人: David Frank , Nathaniel Joos
- 申请人: David Frank , Nathaniel Joos
- 主分类号: C25B9/06
- IPC分类号: C25B9/06 ; C25B9/10 ; C25B9/18 ; C25B9/20 ; C25B15/08 ; H01M8/02 ; H01M8/04 ; H01M8/10 ; H01M8/24
摘要:
Aspects of some embodiments of the present invention provide flow field plates that have been designed to include a flow field for uniformly distributing both a process gas/fluid and heat produced by an electrochemical reaction involving the process gas/fluid over an area covered by the flow field. Thus, for some embodiments of the present invention, in order to achieve a substantially uniform heat distribution and, possibly, in turn a substantially uniform reaction rate over the flow field, the process gas/fluid within each of the flow channels is preferably subjected to substantially the same heat exchange history as the process gas/fluid in any of the other flow channels. In some embodiments of the invention, this is accomplished by making all of the flow channels substantially the same total length.
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