发明申请
- 专利标题: Vapor assisted growth of gallium nitride
- 专利标题(中): 氮化镓的气相生长
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申请号: US10853920申请日: 2004-05-26
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公开(公告)号: US20050263065A1公开(公告)日: 2005-12-01
- 发明人: Gerald Negley
- 申请人: Gerald Negley
- 主分类号: C30B23/00
- IPC分类号: C30B23/00 ; C30B23/02 ; C30B25/00 ; C30B28/12 ; C30B28/14 ; C30B29/40 ; H01L21/00
摘要:
A vapor transport growth process for bulk growth of high quality gallium nitride for semiconductor applications is disclosed. The method includes the steps of heating a gallium nitride source material, a substrate suitable for epitaxial growth of GaN thereon, ammonia, a transporting agent that will react with GaN to form gallium-containing compositions, and a carrier gas to a temperature sufficient for the transporting agent to form volatile Ga-containing compositions from the gallium nitride source material. The method is characterized by maintaining the temperature of the substrate sufficiently lower than the temperature of the source material to encourage the volatile gallium-containing compositions to preferentially form GaN on the substrate.
公开/授权文献
- US07303632B2 Vapor assisted growth of gallium nitride 公开/授权日:2007-12-04
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