发明申请
US20050266321A1 Mask for proximity field optical exposure, exposure apparatus and method therefor
审中-公开
用于近场光学曝光的掩模，曝光装置及其方法
- 专利标题： Mask for proximity field optical exposure, exposure apparatus and method therefor
- 专利标题（中）： 用于近场光学曝光的掩模，曝光装置及其方法
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申请号： US11144944申请日： 2005-06-06
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公开(公告)号： US20050266321A1公开(公告)日： 2005-12-01
- 发明人: Isao Tsuruma , Masayuki Naya , Atsushi Mukai
- 申请人： Isao Tsuruma , Masayuki Naya , Atsushi Mukai
- 专利权人： FUJI PHOTO FILM CO., LTD.
- 当前专利权人： FUJI PHOTO FILM CO., LTD.
- 优先权： JPP.2001-353377 20011119
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/58 ; G03C5/00 ; G03F1/00 ; G03F1/60 ; G03F1/82 ; G03F7/20 ; H01L21/027
摘要：
A mask for exposure 1 having an aperture in a prescribed pattern formed on one surface and subjected to proximity field exposure in a state kept in contact with the surface of a wafer 2. The mask 1 is made of a transparent material such as glass or quartz glass. The mask 1 forms a circular shape with a thickness of 1 mm or less, preferably 0.1-0.5 mm.
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