发明申请
US20050267277A1 Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition
审中-公开
用于形成抗反射涂膜的组合物，由该组合物组成的抗反射涂膜以及使用该组合物形成抗蚀剂图案的方法
- 专利标题： Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition
- 专利标题（中）： 用于形成抗反射涂膜的组合物，由该组合物组成的抗反射涂膜以及使用该组合物形成抗蚀剂图案的方法
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申请号： US11131205申请日： 2005-05-18
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公开(公告)号： US20050267277A1公开(公告)日： 2005-12-01
- 发明人: Masaru Takahama , Yoshinori Sakamoto , Takeshi Tanaka , Naoki Yamashita
- 申请人： Masaru Takahama , Yoshinori Sakamoto , Takeshi Tanaka , Naoki Yamashita
- 优先权： JP2004-156333 20040526
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; C08G77/26 ; G03F7/004 ; G03F7/075 ; H01L21/027
摘要：
The composition for forming an anti-reflective coating film of the present invention has a hard-volatility and high coating performance. In particular, when the 193 nm ArF excimer laser beam source is applied, the composition exhibits a higher etching property. Therefore, the composition is suitably for forming an anti-reflective coating film with no voids and for a method of forming resist patterns using the composition. The composition for forming an anti-reflective coating film comprising; (A) a hard-volatility light absorbing compound, (B) siloxanepolymer, and (C) a solvent.
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