发明申请
- 专利标题: Method and apparatus for measuring three-dimensional shape of specimen by using SEM
- 专利标题(中): 用SEM测量样品三维形状的方法和装置
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申请号: US11156478申请日: 2005-06-21
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公开(公告)号: US20050285034A1公开(公告)日: 2005-12-29
- 发明人: Maki Tanaka , Atsushi Miyamoto , Hidetoshi Morokuma , Chie Shishido , Mitsuji Ikeda , Yasutaka Toyoda
- 申请人: Maki Tanaka , Atsushi Miyamoto , Hidetoshi Morokuma , Chie Shishido , Mitsuji Ikeda , Yasutaka Toyoda
- 优先权: JP2004-184682 20040623
- 主分类号: H01J37/28
- IPC分类号: H01J37/28
摘要:
The present invention relates to a method and apparatus for measuring a three-dimensional profile using a SEM, capable of accurately measuring the three-dimensional profile of even a flat surface or a nearly vertical surface based on the inclination angle dependence of the amount of secondary electron image signal detected by the SEM. Specifically, a tilt image obtaining unit obtains a tilt image (a tilt secondary electron image) I(2) of flat regions a and c1 on a pattern to be measured by using an electron beam incident on the pattern from an observation direction φ(2). Then, profile measuring units presume the slope (or surface inclination angle) at each point on the pattern based on the obtained tilt image and integrate successively each presumed slope value (or surface inclination angle value) to measure three-dimensional profiles S2a and S2c. This arrangement allows a three-dimensional profile to be accurately measured.
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