发明申请
US20050287783A1 Microelectronic devices and methods for forming interconnects in microelectronic devices
有权
用于在微电子器件中形成互连的微电子器件和方法
- 专利标题: Microelectronic devices and methods for forming interconnects in microelectronic devices
- 专利标题(中): 用于在微电子器件中形成互连的微电子器件和方法
-
申请号: US10879838申请日: 2004-06-29
-
公开(公告)号: US20050287783A1公开(公告)日: 2005-12-29
- 发明人: Kyle Kirby , Salman Akram , David Hembree , Sidney Rigg , Warren Farnworth , William Hiatt
- 申请人: Kyle Kirby , Salman Akram , David Hembree , Sidney Rigg , Warren Farnworth , William Hiatt
- 主分类号: H01L21/44
- IPC分类号: H01L21/44 ; H01L21/4763 ; H01L21/768 ; H01L23/48 ; H01L23/52 ; H01L29/40 ; H05K1/03 ; H05K3/40 ; H05K3/42
摘要:
Microelectronic devices, methods for packaging microelectronic devices, and methods for forming interconnects in microelectronic devices are disclosed herein. In one embodiment, a method comprises providing a microelectronic substrate having a front side and a backside. The substrate has a microelectronic die including an integrated circuit and a terminal operatively coupled to the integrated circuit. The method also includes forming a passage at least partially through the substrate and having an opening at the front side and/or backside of the substrate. The method further includes sealing the opening with a conductive cap that closes one end of the passage while another end of the passage remains open. The method then includes filling the passage with a conductive material.
公开/授权文献
信息查询
IPC分类: