发明申请
- 专利标题: Method to monitor pad wear in CMP processing
- 专利标题(中): 在CMP处理中监测焊盘磨损的方法
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申请号: US10879629申请日: 2004-06-29
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公开(公告)号: US20050287927A1公开(公告)日: 2005-12-29
- 发明人: Michael Berman , Steven Reder , Matthew Trattles
- 申请人: Michael Berman , Steven Reder , Matthew Trattles
- 主分类号: B24B37/04
- IPC分类号: B24B37/04 ; B24B49/10 ; B24B49/12 ; B24B55/00 ; B24B49/00
摘要:
A pad groove analyzer and associated method configured to assess the grooves on the pad and determine how worn the pad is. The pad groove analyzer may be configured to monitor the grooves via a contact or no-contact process. In a contact process, the pad groove analyzer may include a stylus which physically contacts and moves along the pad. As the stylus falls into the grooves in the pad as the stylus moves along the pad, signals are created, and a stylus monitor uses the signals to determine to what extent the pad is worn. The stylus monitor can be configured to communicate with the general tool controller. In a no-contact process, the pad groove analyzer may take several different forms.
公开/授权文献
- US07198546B2 Method to monitor pad wear in CMP processing 公开/授权日:2007-04-03
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