发明申请
US20060001857A1 Apparatus to vary dimensions of a substrate during nano-scale manufacturing
有权
用于在纳米级制造期间改变衬底尺寸的装置
- 专利标题: Apparatus to vary dimensions of a substrate during nano-scale manufacturing
- 专利标题(中): 用于在纳米级制造期间改变衬底尺寸的装置
-
申请号: US11142839申请日: 2005-06-01
-
公开(公告)号: US20060001857A1公开(公告)日: 2006-01-05
- 发明人: Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
- 申请人: Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
- 专利权人: Molecular Imprints, Inc.
- 当前专利权人: Molecular Imprints, Inc.
- 主分类号: G03B27/58
- IPC分类号: G03B27/58
摘要:
The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
公开/授权文献
信息查询