- 专利标题： Photosensitive composition and method for forming pattern using same
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申请号： US11149209申请日： 2005-06-10
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公开(公告)号： US20060003254A1公开(公告)日： 2006-01-05
- 发明人: Satoshi Saito
- 申请人： Satoshi Saito
- 申请人地址： JP Tokyo
- 专利权人： KABUSHIKI KAISHA TOSHIBA
- 当前专利权人： KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址： JP Tokyo
- 优先权： JPP.2004-174176 20040611
- 主分类号： G03C1/492
- IPC分类号： G03C1/492
摘要：
The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating acid with an ultraviolet ray or an ionizing radiation wherein m represents an integer of 0 or more.