发明申请
- 专利标题： Alignment marker and lithographic apparatus and device manufacturing method using the same
- 专利标题（中）： 对准标记和光刻设备及使用其的器件制造方法
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申请号： US11147114申请日： 2005-06-08
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公开(公告)号： US20060007442A1公开(公告)日： 2006-01-12
- 发明人: Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
- 申请人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G01B11/00
- IPC分类号： G01B11/00
摘要：
An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
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