Invention Application
- Patent Title: Nonvolatile semiconductor memory device and method for fabricating the same
- Patent Title (中): 非易失性半导体存储器件及其制造方法
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Application No.: US11191963Application Date: 2005-07-29
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Publication No.: US20060023538A1Publication Date: 2006-02-02
- Inventor: Ryuji Nishihara , Masashi Agata , Toshiaki Kawasaki , Masanori Shirahama
- Applicant: Ryuji Nishihara , Masashi Agata , Toshiaki Kawasaki , Masanori Shirahama
- Priority: JP2004-225081 20040802
- Main IPC: G11C7/02
- IPC: G11C7/02 ; G11C16/04

Abstract:
A semiconductor memory device includes: first and second bit cells for storing complementary data; a scan circuit for outputting a selected data signal; a bit-cell selector receiving the output of the scan circuit and selecting one of the bit cells; and a data write controlling circuit for controlling data writing. Write paths for all the bit cells for storing “0” are not selected and data is written only in a bit cell for storing “1”, so that write operation performed in steps is achieved.
Public/Granted literature
- US07184304B2 Nonvolatile semiconductor memory device and method for fabricating the same Public/Granted day:2007-02-27
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