发明申请
US20060029884A1 Polymer, resist protective coating material, and patterning process
有权
聚合物,抗蚀剂保护涂层材料和图案化工艺
- 专利标题: Polymer, resist protective coating material, and patterning process
- 专利标题(中): 聚合物,抗蚀剂保护涂层材料和图案化工艺
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申请号: US11196450申请日: 2005-08-04
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公开(公告)号: US20060029884A1公开(公告)日: 2006-02-09
- 发明人: Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
- 申请人: Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
- 申请人地址: JP Tokyo JP Ube-shi
- 专利权人: Shin-Etsu Chemical Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Ube-shi
- 优先权: JP2004-229085 20040805; JP2005-155103 20050527
- 主分类号: G03C1/76
- IPC分类号: G03C1/76
摘要:
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.