发明申请
- 专利标题： Method to provide a layer with uniform etch characteristics
- 专利标题（中）： 提供具有均匀蚀刻特性的层的方法
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申请号： US10919224申请日： 2004-08-16
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公开(公告)号： US20060035029A1公开(公告)日： 2006-02-16
- 发明人: Frank Xu , Christopher Mackay , Pankaj Lad , Ian McMackin , Van Truskett , Wesley Martin , Edward Fletcher , David Wang , Nicholas Stacey , Michael Watts
- 申请人： Frank Xu , Christopher Mackay , Pankaj Lad , Ian McMackin , Van Truskett , Wesley Martin , Edward Fletcher , David Wang , Nicholas Stacey , Michael Watts
- 申请人地址： US TX Austin
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 当前专利权人地址： US TX Austin
- 主分类号： B05D3/12
- IPC分类号： B05D3/12 ; B05D3/02
摘要：
The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.
公开/授权文献
- US07939131B2 Method to provide a layer with uniform etch characteristics 公开/授权日：2011-05-10
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