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    System for controlling a volume of material on a mold
    3.
    发明申请
    System for controlling a volume of material on a mold 有权
    用于控制模具上的材料体积的系统

    公开(公告)号：US20060121141A1

    公开(公告)日：2006-06-08

    申请号：US11101139

    申请日：2005-04-07

    申请人： Steven Shackleton ,  Ian McMackin ,  Pankaj Lad ,  Van Truskett

    发明人： Steven Shackleton ,  Ian McMackin ,  Pankaj Lad ,  Van Truskett

    IPC分类号： B29C35/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    摘要： A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.

    摘要翻译： 一种用于控制模具上的液体体积的系统，其特征在于，具有限定体积的主体，所述体积具有形成在所述主体中并且定位成靠近所述模具的孔。 泵系统与主体流体连通，并且孔和泵系统被建立以产生在模具和体积之间移动的流体流。 以这种方式，除去一定量的流体，同时保留在模具上是流体的期望部分以进行压印光刻工艺。

    METHOD FOR CONTROLLING DISTRIBUTION OF FLUID COMPONENTS ON A BODY
    6.
    发明申请
    METHOD FOR CONTROLLING DISTRIBUTION OF FLUID COMPONENTS ON A BODY 有权
    控制流体成分在体内分布的方法

    公开(公告)号：US20070141271A1

    公开(公告)日：2007-06-21

    申请号：US11608374

    申请日：2006-12-08

    申请人： Frank Xu ,  Ian McMackin ,  Pankaj Lad ,  Michael Watts

    发明人： Frank Xu ,  Ian McMackin ,  Pankaj Lad ,  Michael Watts

    IPC分类号： C08F2/48

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention provides a method of controlling the distribution of a fluid on a body that features compensating for varying distribution of constituent components of a composition that moved over a surface of a substrate. To that end, the method includes generating a sequence of patterns of liquid upon a substrate, each of which includes a plurality of spaced-apart liquid regions, with voids being defined between adjacent liquid regions. A second of the patterns of liquid of the sequence is arranged so that the liquid regions associated therewith are in superimposition with the voids of a first of the patterns of liquid of the sequence.

    摘要翻译： 本发明提供一种控制流体在体上的分布的方法，其特征在于补偿在衬底的表面上移动的组合物的组成成分的变化分布。 为此，该方法包括在衬底上产生一系列液体图案，每个衬底包括多个间隔开的液体区域，空隙位于相邻的液体区域之间。 布置了序列液体的第二种图案，使得与其相关联的液体区域与序列的第一种液体图案的空隙重叠。

    Method for fast filling of templates for imprint lithography using on template dispense
    8.
    发明申请
    Method for fast filling of templates for imprint lithography using on template dispense 有权
    使用模板分配快速填充压印光刻模板的方法

    公开(公告)号：US20060121728A1

    公开(公告)日：2006-06-08

    申请号：US11101140

    申请日：2005-04-07

    申请人： Ian McMackin ,  Pankaj Lad ,  Van Truskett

    发明人： Ian McMackin ,  Pankaj Lad ,  Van Truskett

    IPC分类号： H01L21/4763

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    摘要： A method of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.

    摘要翻译： 在衬底上沉积材料的方法特征在于，用液体填充衬底的凹槽，并且使用流体在凹槽外部除去存在于衬底上的材料，即施加流体射流的真空。 为此，本发明的一种方法包括在其中形成有凹部的基底的表面上沉积液体量，以一部分液体进入凹部的体积。 液体的数量被设置在靠近凹部的表面的区域上。 此后，在将该部分保持在体积内的同时除去液体的量。 以这种方式，该部分可以被转移到另外的基底上。 更具体地说，该部分可以与一层可流动的材料接触并与之交联，通过将液体和可流动材料暴露于光化辐射。