Invention Application
US20060037933A1 Mirror process using tungsten passivation layer for preventing metal-spiking induced mirror bridging and improving mirror curvature 审中-公开
使用钨钝化层的镜面工艺,用于防止金属尖峰引起的反射镜桥接和改善镜面曲率

Mirror process using tungsten passivation layer for preventing metal-spiking induced mirror bridging and improving mirror curvature
Abstract:
A mirror process uses a tungsten passivation layer to prevent metal-spiking induced mirror bridging and improve mirror curvature. A mirror structure is patterned on a first sacrificial layer overlying a substrate. A tungsten passivation layer is then blanket deposited to cover the top and sidewalls of the mirror structure. A second sacrificial layer is formed overlying the tungsten passivation layer. A releasing process with an etchant including XeF2 is performed to remove the second sacrificial layer, the tungsten passivation layer and the first sacrificial layer simultaneously.
Public/Granted literature
Information query
Patent Agency Ranking
0/0