Invention Application
- Patent Title: Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
- Patent Title (中): 带电粒子束装置和通过使用它们形成具有窄间隙的电极的方法
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Application No.: US11196094Application Date: 2005-08-03
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Publication No.: US20060038137A1Publication Date: 2006-02-23
- Inventor: Toshiaki Fujii , Masao Abe , Kunji Shigeto , Minuru Kawamura , Alekber Kasumov , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
- Applicant: Toshiaki Fujii , Masao Abe , Kunji Shigeto , Minuru Kawamura , Alekber Kasumov , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
- Priority: JP2004-240998 20040820
- Main IPC: G21K7/00
- IPC: G21K7/00
Abstract:
A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.
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