发明申请
- 专利标题： Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
- 专利标题（中）： 带电粒子束装置和通过使用它们形成具有窄间隙的电极的方法
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申请号： US11196094申请日： 2005-08-03
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公开(公告)号： US20060038137A1公开(公告)日： 2006-02-23
- 发明人: Toshiaki Fujii , Masao Abe , Kunji Shigeto , Minuru Kawamura , Alekber Kasumov , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
- 申请人： Toshiaki Fujii , Masao Abe , Kunji Shigeto , Minuru Kawamura , Alekber Kasumov , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
- 优先权： JP2004-240998 20040820
- 主分类号： G21K7/00
- IPC分类号： G21K7/00
摘要：
A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.
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