发明申请
- 专利标题: Slot designs in wide metal lines
- 专利标题(中): 狭槽金属线槽设计
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申请号: US10923123申请日: 2004-08-21
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公开(公告)号: US20060040491A1公开(公告)日: 2006-02-23
- 发明人: Yeow Lim , Alex See , Tae Lee , David Vigar , Liang Hsia , Kin Pey
- 申请人: Yeow Lim , Alex See , Tae Lee , David Vigar , Liang Hsia , Kin Pey
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763
摘要:
A method and structure for slots in wide lines to reduce stress. An example embodiment method and structure for is an interconnect structure comprising: interconnect comprising a wide line. The wide line has a first slot. The first slot is spaced a first distance from a via plug so that the first slot relieves stress on the wide line and the via plug. The via plug can contact the wide line from above or below. Another example embodiment is a dual damascene interconnect structure comprising: an dual damascene shaped interconnect comprising a via plug, a first slot and a wide line. The wide line has the first slot. The first slot is spaced a first distance from the via plug so that the first slot relieves stress on the wide line and the via plug.
公开/授权文献
- US09318378B2 Slot designs in wide metal lines 公开/授权日:2016-04-19